photoacid
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Photoresist — A photoresist is a light sensitive material used in several industrial processes, such as photolithography and photoengraving to form a patterned coating on a surface. Contents 1 Photoresist categories 1.1 Tone 1.2 Developing light wavelength … Wikipedia
Immersion lithography — is a photolithography resolution enhancement technique that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal… … Wikipedia
Perfluorooctanesulfonic acid — Chembox new Name = Perfluorooctanesulfonic acid ImageFile = Perfluorooctanesulfonic acid.png ImageName = OtherNames = Section1 = Chembox Identifiers CASNo = 1763 23 1 SMILES = OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F… … Wikipedia
Resist — is also an album by Kosheen and a song by Rush. In semiconductor fabrication, resist refers to both: # A thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via… … Wikipedia
Interference lithography — (or holographic lithography) is a technique for patterning regular arrays of fine features, without the use of complex optical systems or photomasks. Basic principleThe basic principle is the same as in interferometry or holography. An… … Wikipedia
Immersionslithografie — Bei der Immersionlithographie, durchquert das Licht von oben ein System von Linsen (1.) und einen dünnen Flüssigkeitsfilm (2.; im Beispiel Wasser) bevor es den Fotolack auf der Oberseite des Wafers (3.) erreicht. Die Immersionslithografie ist… … Deutsch Wikipedia
